The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2008

Filed:

Sep. 28, 2006
Applicants:

James M. Holden, San Jose, CA (US);

William A. Mcgahan, Spicewood, TX (US);

Richard A. Yarussi, San Francisco, CA (US);

Pablo I. Rovira, San Francisco, CA (US);

Roger R. Lowe-webb, Mountain View, CA (US);

Inventors:

James M. Holden, San Jose, CA (US);

William A. McGahan, Spicewood, TX (US);

Richard A. Yarussi, San Francisco, CA (US);

Pablo I. Rovira, San Francisco, CA (US);

Roger R. Lowe-Webb, Mountain View, CA (US);

Assignee:

Nanometrics Incorporated, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 3/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A normal incidence reflectometer includes a rotatable analyzer/polarizer for measurement of a diffracting structure. Relative rotation of the analyzer/polarizer with respect to the diffracting structure permits analysis of the diffracted radiation at multiple polarity orientations. A spectograph detects the intensity of the spectral components at different polarity orientations. Because the normal incidence reflectometer uses normally incident radiation and an analyzer/polarizer that rotates relative to the diffracting structure, or vice-versa, the orientation of the diffracting structure does not affect the accuracy of the measurement. Thus, the sample holding stage may use X, Y, and Z, as well as r-θ type movement and there is no requirement that the polarization orientation of the incident light be aligned with the grating of the diffraction structure. A non-linear multivariate regression process is used to adjust the parameters of an optical model, such as rigorous coupled-wave analysis, to provide a match with the measured data.


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