The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2007
Filed:
Mar. 07, 2005
Weidong Yang, Milpitas, CA (US);
Roger R. Lowe-webb, Sunnyvale, CA (US);
John D. Heaton, Fremont, CA (US);
Guonguang LI, Fremont, CA (US);
Weidong Yang, Milpitas, CA (US);
Roger R. Lowe-Webb, Sunnyvale, CA (US);
John D. Heaton, Fremont, CA (US);
Guonguang Li, Fremont, CA (US);
Nanometrics Incorporated, Milpitas, CA (US);
Abstract
An alignment target includes periodic patterns on two elements. The alignment target includes two locations, at least one of which has a designed in offset. In one embodiment, both measurement locations have a designed in offset of the same magnitude but opposite directions. For example, two separate overlay patterns that are mirror images of each other may be used. Alternatively, the magnitudes and/or directions may vary between the measurement locations. The radiation that interacts with the measurement locations is compared. The calculated difference is extremely sensitive to any alignment error. If the difference between the patterns is approximately zero, the elements are properly aligned. When an alignment error is introduced, however, calculated difference can be used to determine the error. In one embodiment, the alignment target is modeled to determine the alignment error. In another embodiment, additional overlay patterns with additional reference offsets are used to determine the alignment error.