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Weidong Yang: Innovator in Optical Metrology
Weidong Yang, a prolific inventor hailing from Milpitas, CA, has made significant contributions to the field of optical metrology. With a total of 11 patents to his name, his expertise and dedication have played a crucial role in advancing computational efficiency and accuracy in this domain.
One of Yang's latest patents, titled "Computation Efficiency by Diffraction Order Truncation," introduces a novel method for improving computation efficiency in optical metrology for diffraction signals. The approach involves simulating a set of diffraction orders for a three-dimensional structure and then prioritizing and truncating the set based on the prioritization. By providing a simulated spectrum based on the truncated set of diffraction orders, Yang's invention enables faster and more efficient computations in optical metrology applications.
In addition to this, Yang has also pioneered a method called "Determining Profile Parameters of a Structure Using Approximation and Fine Diffraction Models in Optical Metrology." This patent describes a technique for determining profile parameters of a structure using an optical metrology model that incorporates a profile model, an approximation diffraction model, and a fine diffraction model. Through the generation of simulated approximation diffraction signals and the training of a machine learning system using a set of difference diffraction signals, this invention allows the accurate determination of profile parameters based on measured diffraction signals.
Throughout his career, Weidong Yang has worked with esteemed companies in the optical metrology industry. Notably, he has contributed his expertise to Nanometrics Inc. and KLA-Tencor Corporation. Collaborating with colleagues such as Roger R Lowe-Webb and John D Heaton, Yang has brought forth innovative solutions to advance optical metrology technologies.
Yang's patents and inventions in the field of optical metrology have undoubtedly made a significant impact within the industry. As an inventor and innovator, Weidong Yang continues to push the boundaries of computational efficiency and accuracy in optical metrology, revolutionizing how this technology is utilized in various applications.