The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2017
Filed:
Aug. 18, 2008
Joerg Bischoff, Ilmenau, DE;
Shifang LI, Pleasanton, CA (US);
Weidong Yang, Milpitas, CA (US);
Hanyou Chu, Palo Alto, CA (US);
Joerg Bischoff, Ilmenau, DE;
Shifang Li, Pleasanton, CA (US);
Weidong Yang, Milpitas, CA (US);
Hanyou Chu, Palo Alto, CA (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
A method for improving computation efficiency for diffraction signals in optical metrology is described. The method includes simulating a set of diffraction orders for a three-dimensional structure. The diffraction orders within the set of diffraction orders are then prioritized. The set of diffraction orders is truncated to provide a truncated set of diffraction orders based on the prioritizing. Finally, a simulated spectrum is provided based on the truncated set of diffraction orders.