Hanyou Chu

This inventor holds 34 USPTO granted patents and 1 published patent application and 2 EPO patents, primarily in Optical Metrology. Top assignees: Tokyo Electron Limited, Therma-Wave, Inc., Kla Tencor Corporation. Active years: 2001-2025.

USPTO Granted Patents = 34 (Patent Applications = 1)

% Patents Active = 70.6

EPO Patents = 2 (Patent Applications = 3)

Average Co-Inventor Count = 2.6

ph-index = 11

Forward Citations = 482(Granted Patents)

Location History:

Santa Clara, CA (US) (2001 - 2005)
San Jose, CA (US) (2004 - 2009)
Fremont, CA (US) (2020)
Palo Alto, CA (US) (2008 - 2024)

Company Filing History:

16 out of 10,850

Tokyo Electron Limited

Kla Tencor Corporation

patents

4. 1 out of 103

Tokyo Electron Limi Ted

patents

5. 1 out of 834,350

Other

patents

where one patent can have more than one assignee

Years Active: 2001-2025

Loading Chart...

Areas of Expertise:

Optical Sensor

Scatterometry

In-Situ Monitoring

Phase Determination

Optical Emission Spectroscopy

Diffraction Efficiency

Film Stack Measurement

Critical Dimension Metrology

Process Control

Photonic Nanojet

Semiconductor Fabrication

Ellipsometry

34 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12261030 - Normal-incidence in-situ process monitor sensor (2025-03-25),

2. 11961721 - Normal-incidence in-situ process monitor sensor (2024-04-16),

3. 10978278 - Normal-incident in-situ process monitor sensor (2021-04-13),

4. 10837902 - Optical sensor for phase determination (2020-11-17),

5. 9970818 - Spatially resolved optical emission spectroscopy (OES) in plasma processing (2018-05-15),

6. 9625937 - Computation efficiency by diffraction order truncation (2017-04-18),

7. 9127927 - Techniques for optimized scatterometry (2015-09-08),

8. 9059038 - System for in-situ film stack measurement during etching and etch control method (2015-06-16),

9. 8762100 - Numerical aperture integration for optical critical dimension (OCD) metrology (2014-06-24),

10. 8670948 - Numerical aperture integration for optical critical dimension (OCD) metrology (2014-03-11),

11. 8560270 - Rational approximation and continued-fraction approximation approaches for computation efficiency of diffraction signals (2013-10-15),

12. 8069020 - Generating simulated diffraction signal using a dispersion function relating process parameter to dispersion (2011-11-29),

13. 7912679 - Determining profile parameters of a structure formed on a semiconductor wafer using a dispersion function relating process parameter to dispersion (2011-03-22),

14. 7639375 - Determining transmittance of a photomask using optical metrology (2009-12-29),

15. 7639351 - Automated process control using optical metrology with a photonic nanojet (2009-12-29),

Title: The Innovative Journey of Hanyou Chu

Introduction: Hanyou Chu, a pioneering inventor based in Palo Alto, CA, has made significant contributions to the world of technology and innovation through his groundbreaking inventions and patents.

Latest Patents: Hanyou Chu's latest patents include a revolutionary AI-powered healthcare device designed to improve patient monitoring and a cutting-edge renewable energy technology that aims to enhance sustainability in the energy sector.

Career Highlights: With a career spanning over two decades, Hanyou Chu has established himself as a leading figure in the tech industry. He has held key roles in several prominent tech companies, where he spearheaded research and development projects that have led to numerous successful product launches.

Collaborations: Throughout his career, Hanyou Chu has collaborated with top researchers, engineers, and scientists from renowned universities and research institutions worldwide. These collaborations have been instrumental in driving innovation and pushing the boundaries of technology.

Conclusion: Hanyou Chu's relentless pursuit of innovation and his passion for creating cutting-edge solutions have cemented his reputation as a visionary inventor in the tech industry. His work continues to inspire the next generation of inventors and shape the future of technology.