The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2009
Filed:
Dec. 14, 2006
Sanjay Yedur, Fremont, CA (US);
Shifang LI, Pleasanton, CA (US);
Youxian Wen, Fremont, CA (US);
Wei Liu, Santa Clara, CA (US);
Hanyou Chu, Palo Alto, CA (US);
Ying Ying Luo, San Jose, CA (US);
Sanjay Yedur, Fremont, CA (US);
Shifang Li, Pleasanton, CA (US);
Youxian Wen, Fremont, CA (US);
Wei Liu, Santa Clara, CA (US);
Hanyou Chu, Palo Alto, CA (US);
Ying Ying Luo, San Jose, CA (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
Transmittance of a photomask is determined using optical metrology. In particular, reflectance of a portion of the photomask is determined by directing an incident beam of light at the portion of the photomask. The reflectance is determined by measuring light diffracted from the portion of the photomask. One or more geometric features of the portion of the photomask are determined using the measured light diffracted from the portion of the photomask. A wave coupling is determined using the determined one or more geometric features of the portion of the photomask. The transmittance of the photomask is determined using the determined wave coupling and the determined reflectance of the portion of the photomask.