Location History:
- Santa Clara, CA (US) (1999 - 2003)
- San Ramon, CA (US) (2002 - 2006)
- San Jose, CA (US) (2004 - 2008)
- Fremont, CA (US) (2009 - 2010)
Company Filing History:
34 out of 12,883 
4 out of 10,326 
3 out of 72 
Years Active: 1999-2010
Areas of Expertise:
Title: Sanjay K Yedur - Innovator in Photomask Technology
Introduction
Sanjay K Yedur, a prominent inventor located in Santa Clara, CA, has made significant contributions to the field of photomask technology. With an impressive portfolio consisting of 44 patents, he has established himself as a key player in the innovation landscape, particularly within the realm of optical metrology.
Latest Patents
Among his latest innovations, Yedur has developed methods for determining important profile parameters of photomasks covered by pellicles. One crucial patent focuses on creating an optical metrology model that integrates both the photomask and pellicle, allowing for the optimization of their interaction. This model takes into consideration the various optical effects on the illumination beam as it passes through the pellicle and is diffracted by the photomask structure, ultimately leading to the determination of critical profile parameters.
Another significant patent addresses the determination of transmittance of a photomask using optical metrology. In this method, Yedur describes a process that measures reflectance by directing an incident beam of light at a specific area of the photomask and analyzing the light diffracted from that area. The results enable the assessment of transmittance based on the established wave coupling and reflectance metrics.
Career Highlights
Sanjay K Yedur's career includes key positions at renowned companies such as Advanced Micro Devices Corporation and Tokyo Electron Limited. His work in these organizations has led to the development of advanced technologies that enhance the performance and accuracy of photomasks in the semiconductor manufacturing process.
Collaborations
Throughout his career, Yedur has collaborated with other talented individuals, including Bhanwar Singh and Bharath Rangarajan. These partnerships have undoubtedly enriched his work, allowing for cross-pollination of ideas and an expansion of innovation in optical metrology and photomask technologies.
Conclusion
Sanjay K Yedur exemplifies the spirit of innovation in the field of photomask technology. With his substantial patent portfolio and collaborative efforts, he continues to shape and advance the industry. His contributions are vital for the ongoing evolution of optical metrology, ensuring that the semiconductor sector remains at the forefront of technological advancement.