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Washington, DC, United States of America

Timbre Technologies, Inc.

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USPTO Granted Patents = 72

% Expired Patents = 36.1

Forward Citations = 1,735

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39 inventors (with patents filed for the assignee):

Xinhui Niu (37 out of 42 patents)

Nickhil Jakatdar (36 out of 46 patents)

Junwei Bao (30 out of 131 patents)

4. Vi Vuong (15 out of 41 patents)

5. Joerg Bischoff (13 out of 24 patents)

6. Shifang Li (12 out of 72 patents)

7. Srinivas Rao Doddi (12 out of 25 patents)

8. Emmanuel Drege (9 out of 18 patents)

9. Lawrence Lane (6 out of 7 patents)

10. Manuel B Madriaga (4 out of 30 patents)

11. Michael Laughery (3 out of 3 patents)

12. Sanjay K Yedur (3 out of 44 patents)

13. Saeed Assadi (2 out of 2 patents)

14. James Pogge (2 out of 2 patents)

15. Jason Ferns (2 out of 9 patents)

Core Competencies:

Optical Metrology

Integrated Circuits

Machine Learning

Wafer Characterization

Pattern Resist Structures

Diffraction Signals

Grating Profiles

Overlay Measurements

Parametric Optimization

Data Compression

Library Generation

72 patents: Sort by Forward Citations

1. 11835391 - Radiation detector including field effect transistor in resonant cavity nanostructure (2023-12-05),

2. 11209318 - Radiation detector including field effect transistor in resonant cavity nanostructure (2021-12-28),

3. 7515282 - Modeling and measuring structures with spatially varying properties in optical metrology (2009-04-07),

4. 7505153 - Model and parameter selection for optical metrology (2009-03-17),

5. 7474993 - Selection of wavelengths for integrated circuit optical metrology (2009-01-06),

6. 7474420 - In-die optical metrology (2009-01-06),

7. 7467064 - Transforming metrology data from a semiconductor treatment system using multivariate analysis (2008-12-16),

8. 7453584 - Examining a structure formed on a semiconductor wafer using machine learning systems (2008-11-18),

9. 7450232 - Generic interface for an optical metrology system (2008-11-11),

10. 7444196 - Optimized characterization of wafers structures for optical metrology (2008-10-28),

11. 7440881 - Adaptive correlation of pattern resist structures using optical metrology (2008-10-21),

12. 7428060 - Optimization of diffraction order selection for two-dimensional structures (2008-09-23),

13. 7427521 - Generating simulated diffraction signals for two-dimensional structures (2008-09-23),

14. 7421414 - Split machine learning systems (2008-09-02),

15. 7414733 - Azimuthal scanning of a structure formed on a semiconductor wafer (2008-08-19),

Company Overview

Timbre Technologies, Inc., based in Washington, DC, specializes in advanced optical metrology solutions. The company focuses on developing innovative technologies for wafer characterization, utilizing integrated circuits and machine learning to enhance precision in overlay measurements and pattern resist structures. Their expertise extends to analyzing diffraction signals and grating profiles, positioning them as a key player in the semiconductor industry. Timbre Technologies is committed to advancing optical measurement techniques to meet the evolving demands of high-tech manufacturing.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Nov 10 2026

72 Patents

#26 in Washington, DC

#26 in District of Columbia

#5,118 in US

#10,409 in the World

Washington, DC, United States of America

Timbre Technologies, Inc.

Forward Citations = 1,735

39 inventors:

Xinhui Niu (37 out of 42 patents)

Nickhil Jakatdar (36 out of 46 patents)

Junwei Bao (30 out of 131 patents)

4. Vi Vuong (15 out of 41 patents)

5. Joerg Bischoff (13 out of 24 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Timbre Technologies, Inc.. Retrieved from https://idiyas.com/company/timbre-technologies

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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