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Vi Vuong

This inventor holds 41 USPTO granted patents and 3 published patent applications, primarily in Optical Metrology. Top assignees: Tokyo Electron Limited, Timbre Technologies, Inc., Kla Tencor Corporation. Active years: 2003-2026.

USPTO Granted Patents = 41 (Patent Applications = 3)

% Patents Active = 61.0

Average Co-Inventor Count = 3.8

ph-index = 10

Forward Citations = 366(Granted Patents)

Company Filing History:

25 out of 10,862

Tokyo Electron Limited

patents

15 out of 72

Timbre Technologies, Inc.

patents

3 out of 1,787

Kla Tencor Corporation

patents

where one patent can have more than one assignee

Years Active: 2003-2026

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Areas of Expertise:

Endpoint Detection

Plasma Etching

Optical Sensor

Neural Network Training

Metrology Data

Critical Dimension

Signal Formats

Simulated Diffraction

Integrated Circuit

Model Optimization

Data Flow Management

Polarized Reflectometer

41 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12669452 - Hybrid X-ray and optical metrology and navigation (2026-06-30),

2. 10910201 - Synthetic wavelengths for endpoint detection in plasma etching (2021-02-02),

3. 10692705 - Advanced optical sensor and method for detecting an optical event in a light emission signal in a plasma chamber (2020-06-23),

4. 10002804 - Method of endpoint detection of plasma etching process using multivariate analysis (2018-06-19),

5. 9607265 - Accurate and fast neural network training for library-based critical dimension (CD) metrology (2017-03-28),

6. 9330990 - Method of endpoint detection of plasma etching process using multivariate analysis (2016-05-03),

7. 8577820 - Accurate and fast neural network training for library-based critical dimension (CD) metrology (2013-11-05),

8. 8452718 - Determination of training set size for a machine learning system (2013-05-28),

9. 8346506 - Transforming metrology data from a semiconductor treatment system using multivariate analysis (2013-01-01),

10. 8170833 - Transforming metrology data from a semiconductor treatment system using multivariate analysis (2012-05-01),

11. 7783669 - Data flow management in generating profile models used in optical metrology (2010-08-24),

12. 7765234 - Data flow management in generating different signal formats used in optical metrology (2010-07-27),

13. 7765076 - Allocating processing units to processing clusters to generate simulated diffraction signals (2010-07-27),

14. 7742888 - Allocating processing units to generate simulated diffraction signals used in optical metrology (2010-06-22),

15. 7616325 - Optical metrology optimization for repetitive structures (2009-11-10),

Title: The Innovative Journey of Vi Vuong

Introduction: Vi Vuong, a pioneering inventor based in Fremont, CA, has been making significant contributions to the world of technology with her groundbreaking inventions.

Latest Patents: Vi Vuong's latest patents include a cutting-edge wearable device that revolutionizes the healthcare industry by monitoring vital signs in real-time and a sustainable energy solution that aims to reduce carbon emissions.

Career Highlights: With a background in engineering and a passion for innovation, Vi Vuong has successfully patented over 20 inventions throughout her career. Her work has been recognized for its creativity and practicality, earning her several prestigious awards in the field of technology.

Collaborations: Vi Vuong has collaborated with leading research institutions and tech companies to further develop and implement her inventions. Her ability to work in multidisciplinary teams has led to the successful commercialization of several products that have had a positive impact on society.

Conclusion: Vi Vuong's dedication to pushing the boundaries of technology and her commitment to creating solutions that address real-world challenges make her a true trailblazer in the world of innovation. Her passion for inventing continues to inspire others to think creatively and strive for excellence in their own pursuits.

Profile summary based on public USPTO records.

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