The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2010
Filed:
Jul. 25, 2006
Hemalatha Erva, Fremont, CA (US);
Hong Qiu, Union City, CA (US);
Junwei Bao, Palo Alto, CA (US);
Vi Vuong, Fremont, CA (US);
Hemalatha Erva, Fremont, CA (US);
Hong Qiu, Union City, CA (US);
Junwei Bao, Palo Alto, CA (US);
Vi Vuong, Fremont, CA (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
In allocating processing units of a computer system to generate simulated diffraction signals used in optical metrology, a request for a job to generate simulated diffraction signals using multiple processing units is obtained. A number of processing units requested for the job to generate simulated diffraction signals is then determined. A number of available processing units is determined. When the number of processing units requested is greater than the number of available processing units, a number of processing units is assigned to generate the simulated diffraction signals that is less than the number of processing units requested.