The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2009
Filed:
Jun. 17, 2008
Applicants:
Vi Vuong, Fremont, CA (US);
Junwei Bao, Palo Alto, CA (US);
Joerg Bischoff, Illmenau, DE;
Inventors:
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 3/22 (2006.01); G01B 11/24 (2006.01); G01B 11/30 (2006.01); G01B 13/16 (2006.01); G01B 15/04 (2006.01); G01B 17/06 (2006.01); G01B 21/20 (2006.01);
U.S. Cl.
CPC ...
Abstract
An optical metrology model for a structure to be formed on a wafer is developed by characterizing a top-view profile and a cross-sectional view profile of the structure using profile parameters. The profile parameters of the top-view profile and the cross-sectional view profile are integrated together into the optical metrology model. The profile parameters of the optical metrology model are saved.