Austin, TX, United States of America

Michael Laughery


Average Co-Inventor Count = 3.1

ph-index = 2

Forward Citations = 120(Granted Patents)


Company Filing History:


Years Active: 2004-2009

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3 patents (USPTO):Explore Patents

Title: Michael Laughery: Innovator in Integrated Circuit Metrology

Introduction

Michael Laughery is a notable inventor based in Austin, TX, who has made significant contributions to the field of integrated circuit metrology. With a total of three patents to his name, Laughery's work focuses on enhancing the precision and efficiency of optical metrology processes.

Latest Patents

One of Laughery's latest patents is titled "Selection of wavelengths for integrated circuit optical metrology." This innovation involves selecting specific wavelengths for optical metrology of integrated circuits based on one or more selection criteria and termination criteria. The process iterates until the termination criteria are met, ensuring optimal wavelength selection. Another significant patent is "Metrology diffraction signal adaptation for tool-to-tool matching." This patent describes a method and system for adapting a metrology system to work with diverse metrology devices. It includes generating signal adjustment data to adapt measured diffraction signals, enabling the use of a library of diffraction signals and structure profiles created for different metrology devices.

Career Highlights

Michael Laughery is currently employed at Timbre Technologies, Inc., where he continues to innovate in the field of metrology. His work has been instrumental in advancing the capabilities of integrated circuit testing and measurement.

Collaborations

Throughout his career, Laughery has collaborated with talented individuals such as Nickhil Jakatdar and David Wasinger, contributing to a dynamic and innovative work environment.

Conclusion

Michael Laughery's contributions to integrated circuit metrology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of more efficient metrology systems.

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