The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2008
Filed:
Feb. 07, 2006
Vi Vuong, Fremont, CA (US);
Junwei Bao, Palo Alto, CA (US);
Yan Chen, Santa Clara, CA (US);
Weichert Heiko, Utzberg, DE;
Sebastien Egret, Lumbin, FR;
Vi Vuong, Fremont, CA (US);
Junwei Bao, Palo Alto, CA (US);
Yan Chen, Santa Clara, CA (US);
Weichert Heiko, Utzberg, DE;
Sebastien Egret, Lumbin, FR;
Timbre Technologies, Inc., Santa Clara, CA (US);
Abstract
Metrology data from a semiconductor treatment system is transformed using multivariate analysis. In particular, a set of metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. One or more essential variables for the obtained set of metrology data is determined using multivariate analysis. A first metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. The first obtained metrology data is not one of the metrology data in the set of metrology data earlier obtained. The first metrology data is transformed into a second metrology data using the one or more of the determined essential variables.