The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2006
Filed:
Mar. 25, 2003
Raghu Balasubramanian, Santa Clara, CA (US);
Sanjay Yedur, San Ramon, CA (US);
Vi Vuong, Fremont, CA (US);
Nickhil Jakatdar, Los Altos, CA (US);
Raghu Balasubramanian, Santa Clara, CA (US);
Sanjay Yedur, San Ramon, CA (US);
Vi Vuong, Fremont, CA (US);
Nickhil Jakatdar, Los Altos, CA (US);
Timbre Technologies, Inc., Santa Clara, CA (US);
Abstract
A profile model for use in optical metrology of structures in a wafer is selected based on a template having one or more parameters including characteristics of process and modeling attributes associated with a structure in a wafer. The process includes performing a profile modeling process to generate a profile model of a wafer structure based on a template having one or more parameters including characteristics of process and modeling attributes. The profile model includes a set of geometric parameters associated with the dimensions of the structure. The generated profile model may further be tested against termination criteria and the one or more parameters modified. The process of performing a modeling process to generate a profile model and testing the generated profile model may be repeated until the termination criteria are met.