Santa Clara, CA, United States of America

Raghu Balasubramanian

This inventor holds 1 USPTO granted patent. Top assignee: Timbre Technologies, Inc.. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Raghu Balasubramanian. Retrieved from https://idiyas.com/inventor/raghu-balasubramanian

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 36(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: The Innovations of Raghu Balasubramanian

Introduction

Raghu Balasubramanian is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of optical metrology. His work focuses on optimizing model and parameter selection for various applications.

Latest Patents

Raghu holds 1 patent for his invention titled "Optimized model and parameter selection for optical metrology." This patent describes a profile model used in optical metrology of structures in a wafer. The process involves selecting a profile model based on a template with parameters that include process characteristics and modeling attributes. The generated profile model consists of geometric parameters related to the dimensions of the structure. The modeling process is iterative, allowing for modifications until specific termination criteria are met.

Career Highlights

Raghu is currently employed at Timbre Technologies, Inc., where he continues to innovate in his field. His expertise in optical metrology has positioned him as a valuable asset to his company and the industry.

Collaborations

Raghu has collaborated with talented individuals such as Sanjay K Yedur and Vi Vuong. Their combined efforts contribute to the advancement of technology in their respective fields.

Conclusion

Raghu Balasubramanian's work in optical metrology exemplifies the spirit of innovation. His contributions through patents and collaborations highlight the importance of continuous development in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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