The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2009
Filed:
Jul. 10, 2006
Jeffrey A. Chard, Sunnyvale, CA (US);
Junwei Bao, Palo Alto, CA (US);
Youxian Wen, Fremont, CA (US);
Sanjay Yedur, Fremont, CA (US);
Jeffrey A. Chard, Sunnyvale, CA (US);
Junwei Bao, Palo Alto, CA (US);
Youxian Wen, Fremont, CA (US);
Sanjay Yedur, Fremont, CA (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A profile model to characterize a structure to be examined using optical metrology is evaluated by displaying a set of profile parameters that characterizes the profile model. Each profile parameter has a range of values for the profile parameter. For each profile parameter having a range of values, an adjustment tool is displayed for selecting a value for the profile parameter within the range of values. A measured diffraction signal, which was measured using an optical metrology tool, is displayed. A simulated diffraction signal, which was generated based on the values of the profile parameters selected using the adjustment tools for the profile parameters, is displayed. The simulated diffraction signal is overlaid with the measured diffraction signal.