The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Dec. 12, 2012
Jonathan Iloreta, Menlo Park, CA (US);
Paul Aoyagi, Sunnyvale, CA (US);
Hanyou Chu, Palo Alto, CA (US);
Jeffrey Chard, San Mateo, CA (US);
Peilin Jiang, Santa Clara, CA (US);
Mikhail Sushchik, Pleasanton, CA (US);
Leonid Poslavsky, Belmont, CA (US);
Philip D. Flanner, Iii, Union City, CA (US);
Jonathan Iloreta, Menlo Park, CA (US);
Paul Aoyagi, Sunnyvale, CA (US);
Hanyou Chu, Palo Alto, CA (US);
Jeffrey Chard, San Mateo, CA (US);
Peilin Jiang, Santa Clara, CA (US);
Mikhail Sushchik, Pleasanton, CA (US);
Leonid Poslavsky, Belmont, CA (US);
Philip D. Flanner, III, Union City, CA (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
Provided are optimized scatterometry techniques for evaluating a diffracting structure. In one embodiment, a method includes computing a finite-difference derivative of a field matrix with respect to first parameters (including a geometric parameter of the diffracting structure), computing an analytic derivative of the Jones matrix with respect to the field matrix, computing a derivative of the Jones matrix with respect to the first parameters, and computing a finite-difference derivative of the Jones matrix with respect to second parameters (including a non-geometric parameter). In one embodiment, a method includes generating a transfer matrix having Taylor Series approximations for elements, and decomposing the field matrix into two or more smaller matrices based on symmetry between the incident light and the diffracting structure.