The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2013
Filed:
Dec. 09, 2008
Hanyou Chu, Palo Alto, CA (US);
Hanyou Chu, Palo Alto, CA (US);
Tokyo Electron Limited, Tokyo, JP;
KLA—Tencor Corporation, Milpitas, CA (US);
Abstract
Methods and apparatuses for improving computation efficiency for diffraction signals in optical metrology are described. The method includes simulating a set of diffraction orders for a structure. A set of diffraction efficiencies is determined for the set of diffraction orders. A rational approximation or a continued-fraction approximation is applied to the set of diffraction efficiencies to obtain a rationally approximated set of diffraction efficiencies or a continued-fraction approximated set of diffraction efficiencies, respectively. A simulated spectrum is then provided.
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