Guonguang Li

Title: Guonguang Li: Innovator in Alignment Technology

Introduction

Guonguang Li is a notable inventor based in Fremont, CA, who has made significant contributions to the field of alignment technology. With a focus on precision and accuracy, his work has implications for various applications in technology and manufacturing.

Latest Patents

Guonguang Li holds a patent for an innovative alignment target with a designed-in offset. This alignment target features periodic patterns on two elements, with at least one location having a designed-in offset. The technology allows for extremely sensitive detection of alignment errors by comparing the radiation that interacts with the measurement locations. If the calculated difference between the patterns is approximately zero, it indicates proper alignment. Conversely, any introduced alignment error can be determined through the calculated difference, making this invention a valuable tool in ensuring precision in various applications.

Career Highlights

Li is currently employed at Nanometrics Inc., where he continues to develop and refine technologies that enhance measurement accuracy. His work has positioned him as a key figure in the field of alignment technology, contributing to advancements that benefit multiple industries.

Collaborations

Throughout his career, Guonguang Li has collaborated with esteemed colleagues such as Weidong Yang and Roger R Lowe-Webb. These partnerships have fostered innovation and have led to the development of cutting-edge technologies in alignment and measurement.

Conclusion

Guonguang Li's contributions to alignment technology through his innovative patent demonstrate his commitment to precision and accuracy in measurement. His work at Nanometrics Inc. and collaborations with other professionals highlight his role as a significant inventor in this field.