Emily M True

Title: Emily M. True: Innovator in Lithographic Processing

Introduction

Emily M. True is a prominent inventor based in San Ramon, California. She has made significant contributions to the field of lithographic processing, holding a total of eight patents. Her innovative work focuses on enhancing the efficiency and effectiveness of processing reconstituted wafers used in integrated circuit (IC) chips.

Latest Patents

Among her latest patents is a method for scanning and controlling focus during lithographic processing of reconstituted wafers. This method involves operably disposing the reconstituted wafer in a lithography tool, which defines exposure fields for the IC chips. The process includes scanning the wafer with a line scanner to measure its surface topography and adjusting the wafer's position to ensure that the photoresist layers of the IC chips fall within the depth of focus during exposure.

Another notable patent is the Wynne-Dyson projection lens designed for ultraviolet optical lithography systems. This lens is engineered to have reduced susceptibility to damage from ultraviolet radiation. It utilizes optical glasses that are resistant to UV damage while also correcting aberrations effectively.

Career Highlights

Emily M. True has established herself as a key figure in her field through her innovative patents and contributions to lithographic technology. Her work at Ultratech, Inc. has positioned her as a leader in developing advanced methods and tools for wafer processing.

Collaborations

Throughout her career, Emily has collaborated with notable colleagues, including Ray Ellis and Albert J. Crespin. These partnerships have further enhanced her research and development efforts in lithography.

Conclusion

Emily M. True's contributions to lithographic processing and her innovative patents have significantly impacted the field of semiconductor manufacturing. Her work continues to pave the way for advancements in technology and efficiency in wafer processing.