The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2018
Filed:
Mar. 09, 2016
Applicant:
Ultratech, Inc., San Jose, CA (US);
Inventor:
Yun Wang, Saratoga, CA (US);
Assignee:
Ultratech, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/00 (2006.01); H01L 21/268 (2006.01); H01L 21/324 (2006.01); H01L 21/67 (2006.01); B23K 26/06 (2014.01); B23K 26/0622 (2014.01); B23K 26/00 (2014.01); B23K 26/073 (2006.01); B23K 26/082 (2014.01); B23K 26/352 (2014.01); B23K 26/066 (2014.01); B23K 101/40 (2006.01); B23K 103/00 (2006.01);
U.S. Cl.
CPC ...
B23K 26/0622 (2015.10); B23K 26/0006 (2013.01); B23K 26/0066 (2013.01); B23K 26/066 (2015.10); B23K 26/0643 (2013.01); B23K 26/0648 (2013.01); B23K 26/0738 (2013.01); B23K 26/082 (2015.10); B23K 26/352 (2015.10); H01L 21/268 (2013.01); H01L 21/324 (2013.01); B23K 2201/40 (2013.01); B23K 2203/50 (2015.10); B23K 2203/56 (2015.10); H01S 3/0071 (2013.01); H01S 3/0085 (2013.01);
Abstract
Systems and methods for reducing pulsed laser beam profile non-uniformities for laser annealing are disclosed. The methods include directing an initial pulsed laser beam along an optical axis, and imparting to each light pulse a time-varying angular deflection relative to the optical axis. This forms a new laser beam wherein each light pulse is smeared out over an amount of spatial deflection δ sufficient to reduce the micro-scale intensity variations in the laser beam. The new laser beam is then used to form the line image, which has better intensity uniformity as compared using the initial laser beam to form the line image.