The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2019
Filed:
Oct. 26, 2015
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Madhavi R. Chandrachood, Sunnyvale, CA (US);
Michael N. Grimbergen, Redwood City, CA (US);
Khiem K. Nguyen, San Jose, CA (US);
Richard Lewington, Hayward, CA (US);
Ibrahim M. Ibrahim, San Jose, CA (US);
Sheeba J. Panayil, Santa Clara, CA (US);
Ajay Kumar, Cupertino, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/458 (2006.01); C23C 16/52 (2006.01); C23C 16/455 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3211 (2013.01); C23C 16/4586 (2013.01); C23C 16/45561 (2013.01); C23C 16/45563 (2013.01); C23C 16/52 (2013.01); H01J 37/32449 (2013.01); H01J 37/32715 (2013.01); H01J 37/32935 (2013.01); H01J 37/32963 (2013.01); H01L 21/67253 (2013.01); H01L 21/68785 (2013.01); H01J 2237/334 (2013.01);
Abstract
A plasma reactor has an array of plural gas injectors arranged around a circular side wall that are individually controlled.