The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2010
Filed:
Jan. 27, 2005
Madhavi Chandrachood, Sunnyvale, CA (US);
Ajay Kumar, Cupertino, CA (US);
Wai-fan Yau, Los Altos, CA (US);
Madhavi Chandrachood, Sunnyvale, CA (US);
Ajay Kumar, Cupertino, CA (US);
Wai-Fan Yau, Los Altos, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method for etching chromium and forming a photomask is provided. In one embodiment, a method for etching chromium includes providing a film stack in a processing chamber having a chromium layer, patterning a photoresist layer on the film stack, depositing a conformal protective layer on the patterned photoresist layer, etching the conformal protective layer to expose a chromium layer through the patterned photoresist layer, and etching the chromium layer. The methods for etching chromium of the present invention are particularly suitable for fabricating photomasks.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile