Takeshi Senda

Title: The Innovations of Takeshi Senda

Introduction

Takeshi Senda is a prominent inventor based in Niigata, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His work focuses on manufacturing methods for semiconductor silicon wafers, which are crucial for various electronic applications.

Latest Patents

One of Senda's latest patents involves a manufacturing method for semiconductor silicon wafers. This method ensures that the substrate is doped with phosphorus, achieving a resistivity adjusted to 1.05 mΩ·cm or less. The process includes forming defects in the crystal through the aggregation of phosphorus, resulting in Si—P crystal defects. The method also details the formation of a silicon oxide film on the backside of the substrate, with specific thickness requirements. Another notable patent describes a semiconductor silicon wafer manufacturing method that suppresses P aggregate defects and SF in an epitaxial layer. This method involves a series of mirror-polishing and heat treatment steps, conducted in a mixture gas of hydrogen and argon, to enhance the quality of the silicon wafer.

Career Highlights

Throughout his career, Takeshi Senda has worked with notable companies in the semiconductor industry, including GlobalWafers Japan Co., Ltd. and Covalent Materials Corporation. His expertise in semiconductor manufacturing has positioned him as a key figure in advancing technology in this field.

Collaborations

Senda has collaborated with several professionals in his field, including Koji Izunome and Koji Araki. These collaborations have contributed to the development of innovative solutions in semiconductor technology.

Conclusion

Takeshi Senda's contributions to semiconductor technology through his patents and collaborations highlight his importance as an inventor. His work continues to influence the industry and pave the way for future innovations.