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Kanagawa, Japan

Shibaura Mechatronics Corporation

USPTO Granted Patents = 180

% Expired Patents = 23.9

EPO Patents = 16

Forward Citations = 411

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177 inventors (with patents filed for the assignee):

Konosuke Hayashi (20 out of 20 patents)

Kensuke Demura (19 out of 19 patents)

Masaaki Furuya (17 out of 20 patents)

4. Shinichi Ogimoto (15 out of 15 patents)

5. Hideki Mori (14 out of 50 patents)

6. Yoshinori Hayashi (13 out of 140 patents)

7. Daisuke Matsushima (12 out of 12 patents)

8. Azusa Hirano (12 out of 12 patents)

9. Nobuo Kobayashi (11 out of 18 patents)

10. Yasutsugu Tsuruoka (11 out of 11 patents)

11. Yuji Nagashima (11 out of 13 patents)

12. Masaya Kamiya (10 out of 10 patents)

13. Takashi Ootagaki (10 out of 10 patents)

14. Noboru Kuriyama (9 out of 12 patents)

15. Yoshio Kawamata (8 out of 8 patents)

Core Competencies:

Substrate Processing Apparatus

Film Formation Apparatus

Plasma Processing Apparatus

Substrate Treatment Device

Tablet Printing Apparatus

Processing Liquid Supply Device

Cooling Device

Electromagnetic Wave Attenuator

Supply System

Heater Pipe Gas Leak Detector

Imprint Template Manufacturing

Substrate Transfer Apparatus

180 patents: Sort by Forward Citations

1. 12760405 - Film formation apparatus and film formation method (2026-10-13),

2. 12707930 - Wafer storage container processing apparatus (2026-08-11),

3. 12686037 - Substrate treatment apparatus and processing method of substrate (2026-07-21),

4. 12642031 - Substrate cleaning apparatus (2026-05-26),

5. 12629730 - Cleaning apparatus (2026-05-19),

6. 12532709 - Substrate processing apparatus (2026-01-20),

7. 12472534 - Substrate processing apparatus (2025-11-18),

8. 12412756 - Processing liquid supply device, substrate processing apparatus, and method for inspecting processing liquid supply device (2025-09-09),

9. 12385125 - Film formation apparatus (2025-08-12),

10. 12365976 - Film forming apparatus (2025-07-22),

11. 12363801 - Heat treatment device (2025-07-15),

12. 12354869 - Substrate treatment method and substrate treatment apparatus (2025-07-08),

13. 12354854 - Film formation apparatus (2025-07-08),

14. 12347699 - Supply tank, supply device and supply system (2025-07-01),

15. 12318803 - Supply device and supply system (2025-06-03),

Company Overview

Shibaura Mechatronics Corporation, headquartered in Kanagawa, Japan, specializes in advanced substrate processing technologies. The company develops a range of apparatuses including substrate processing, film formation, and plasma processing devices, catering to industries that require precision in material treatment. Their innovations also encompass tablet printing and processing liquid supply devices, alongside cooling solutions and electromagnetic wave attenuators, positioning them as a key player in the substrate processing sector.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

180 Patents

#22 in Kanagawa

#759 in Japan

#4,641 in the World

Kanagawa, Japan

Shibaura Mechatronics Corporation

Forward Citations = 411

177 inventors:

Konosuke Hayashi (20 out of 20 patents)

Kensuke Demura (19 out of 19 patents)

Masaaki Furuya (17 out of 20 patents)

4. Shinichi Ogimoto (15 out of 15 patents)

5. Hideki Mori (14 out of 50 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Shibaura Mechatronics Corporation. Retrieved from https://idiyas.com/company/shibaura-mechatronics

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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