The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2010
Filed:
Sep. 13, 2007
Hideaki Takano, Shibata, JP;
Miyuki Shimizu, Nishikanbara-gun, JP;
Takeshi Senda, Shibata, JP;
Koji Izunome, Shibata, JP;
Yoshinori Hayashi, Fujisawa, JP;
Kazuhiko Hamatani, Yokohama, JP;
Hideaki Takano, Shibata, JP;
Miyuki Shimizu, Nishikanbara-gun, JP;
Takeshi Senda, Shibata, JP;
Koji Izunome, Shibata, JP;
Yoshinori Hayashi, Fujisawa, JP;
Kazuhiko Hamatani, Yokohama, JP;
Shibaura Mechatronics Corporation, Kanagawa, JP;
Covalent Materials Corporation, Tokyo, JP;
Abstract
An image pickup device disposed in a predetermined position relative to a surface of a strained silicon wafer photographs the surface of the strained silicon wafer in a plurality of rotation angle positions on photographing conditions under which bright lines appearing on the surface of the strained silicon wafer can be photographed, in an environment where a light source device illuminates the surface of the strained silicon wafer which is rotating. A composite image in a predetermined angle position is generated from surface images of the strained silicon wafer in a plurality of rotation angle positions obtained by the image pickup device.