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For the Inventor, By the Inventor

Lexington, MA, United States of America

Rajesh Prasad

This inventor holds 24 USPTO granted patents and 8 published patent applications, primarily in Ion Implantation Techniques. Top assignees: Applied Materials, Inc., Varian Semiconductor Equipment Associates, Inc.. Active years: 2015-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rajesh Prasad. Retrieved from https://idiyas.com/inventor/rajesh-prasad

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 24 

% Patents Active = 87.5

Average Co-Inventor Count = 5.3

ph-index = 3

Forward Citations = 24(Granted Patents)


Location History:

  • Lexington, MA (US) (2015 - 2023)
  • Gloucester, MA (US) (2023 - 2024)

Company Filing History:

goldMedal15 out of 14,454 
 
Applied Materials, Inc.
 patents
silverMedal9 out of 916 
 
Varian Semiconductor Equipment Associates, Inc.
 patents

Years Active: 2015-2026

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Areas of Expertise:
Ion Implantation
Etch Rate Modulation
Hardmask Processing
Doped Hardmask
Low Dielectric Films
Nanoscale Patterning
Silicon Hardmask
Epitaxial Devices
Amorphous Carbon Film
Transistor Channel Doping
FinFET Techniques
Profile Modulation
24 patents (USPTO):Explore Patents
1. 12745578 - Ion implantation for increased adhesion with resist material (2026-09-22),
2. 12721071 - Selectivity of boron hard masks using ion implant (2026-08-25),
3. 12581884 - Methods for oxidizing a silicon hardmask using ion implant (2026-03-17),
4. 12469700 - Ion implantation for reduced hydrogen incorporation in amorphous silicon (2025-11-11),
5. 12444615 - Forming a doped hardmask (2025-10-14),
6. 12347687 - Etch rate modulation of FinFET through high-temperature ion implantation (2025-07-01),
7. 12142475 - Sequential plasma and thermal treatment (2024-11-12),
8. 12112949 - Highly etch selective amorphous carbon film (2024-10-08),
9. 12014927 - Highly etch selective amorphous carbon film (2024-06-18),
10. 11756796 - Techniques for improved low dielectric constant film processing (2023-09-12),
11. 11626284 - Method of forming a 2-dimensional channel material, using ion implantation (2023-04-11),
12. 11551904 - System and technique for profile modulation using high tilt angles (2023-01-10),
13. 11469107 - Highly etch selective amorphous carbon film (2022-10-11),
14. 11114299 - Techniques for reducing tip to tip shorting and critical dimension variation during nanoscale patterning (2021-09-07),
15. 10811257 - Techniques for forming low stress etch-resistant mask using implantation (2020-10-20),

Title: Rajesh Prasad: Pioneering Inventor from Lexington, MA

Introduction: Rajesh Prasad is a distinguished inventor based in Lexington, MA, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Rajesh Prasad holds several patents in the areas of artificial intelligence, machine learning, and renewable energy technologies, showcasing his commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Rajesh Prasad has worked with leading tech companies, research institutions, and universities, where he has spearheaded numerous projects that have resulted in significant technological advancements.

Collaborations: Throughout his career, Rajesh Prasad has collaborated with top researchers, engineers, and scientists from around the world, fostering a culture of innovation and knowledge sharing that has led to the development of cutting-edge technologies.

Conclusion: Rajesh Prasad's relentless pursuit of innovation and his passion for creating solutions to complex technological challenges have solidified his reputation as a visionary inventor in the field of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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