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Gloucester, MA, United States of America

Varian Semiconductor Equipment Associates, Inc.

Calculating rank

USPTO Granted Patents = 916

% Expired Patents = 25.1

EPO Patents = 19

Trademarks = 6

Forward Citations = 5,122

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516 inventors (with patents filed for the assignee):

Joseph C Olson (86 out of 135 patents)

Frank Sinclair (82 out of 144 patents)

Ludovic Godet (68 out of 261 patents)

4. Anthony Renau (61 out of 71 patents)

5. Bon-Woong Koo (60 out of 75 patents)

6. Morgan Evans (46 out of 87 patents)

7. Svetlana Radovanov (46 out of 54 patents)

8. Russell J Low (42 out of 42 patents)

9. John J Hautala (41 out of 102 patents)

10. Timothy J Miller (40 out of 48 patents)

11. Vikram Singh (36 out of 44 patents)

12. Peter F Kurunczi (35 out of 52 patents)

13. Craig Richard Chaney (35 out of 47 patents)

14. Julian G Blake (33 out of 59 patents)

15. Christopher R Hatem (32 out of 35 patents)

Core Competencies:

Ion Implantation

Chemical Deposition

Optical Elements

Surface Engineering

Nanoscale Features

Plasma Cleaning

Epitaxial Devices

Semiconductor Devices

Gratings Formation

Etch-Resistant Mask

FinFET Devices

Particle Contamination

916 patents: Sort by Forward Citations

1. 12104253 - Techniques for controlling precursors in chemical deposition processes (2024-10-01),

2. 11862433 - System and methods using an inline surface engineering source (2024-01-02),

3. 11718914 - Techniques for controlling precursors in chemical deposition processes (2023-08-08),

4. 11691184 - System and tool for cleaning a glass surface of an accelerator column (2023-07-04),

5. 11631588 - Method and apparatus for non line-of-sight doping (2023-04-18),

6. 11574800 - Extreme edge uniformity control (2023-02-07),

7. 11532483 - Spacer sculpting for forming semiconductor devices (2022-12-20),

8. 11495434 - In-situ plasma cleaning of process chamber components (2022-11-08),

9. 11488823 - Techniques to engineer nanoscale patterned features using ions (2022-11-01),

10. 11462546 - Dynamic random access device including two-dimensional array of fin structures (2022-10-04),

11. 11442207 - System and method for forming diffracted optical element having varied gratings (2022-09-13),

12. 11424112 - Transparent halo assembly for reduced particle generation (2022-08-23),

13. 11404278 - Optical component having variable depth gratings and method of formation (2022-08-02),

14. 11404254 - Insertable target holder for solid dopant materials (2022-08-02),

15. 11402649 - System and method for optimally forming gratings of diffracted optical elements (2022-08-02),

Company Overview

Varian Semiconductor Equipment Associates, Inc., based in Gloucester, MA, specializes in advanced semiconductor fabrication technologies. The company is renowned for its expertise in ion implantation, chemical deposition, and surface engineering, which are critical for the production of high-performance semiconductor devices. Varian's innovations extend to nanoscale features, plasma cleaning, and the development of epitaxial devices, positioning it as a key player in the semiconductor industry, driving advancements in manufacturing processes and device performance.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 27 2026

916 Patents

#1 in Gloucester, MA

#29 in Massachusetts

#569 in US

#1,108 in the World

Gloucester, MA, United States of America

Varian Semiconductor Equipment Associates, Inc.

Forward Citations = 5,122

516 inventors:

Joseph C Olson (86 out of 135 patents)

Frank Sinclair (82 out of 144 patents)

Ludovic Godet (68 out of 261 patents)

4. Anthony Renau (61 out of 71 patents)

5. Bon-Woong Koo (60 out of 75 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Varian Semiconductor Equipment Associates, Inc.. Retrieved from https://idiyas.com/company/varian-semiconductor-equipment-associates

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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