Somerville, MA, United States of America

Peter F Kurunczi

This inventor holds 52 USPTO granted patents and 14 published patent applications, primarily in Plasma Processing. Top assignees: Varian Semiconductor Equipment Associates, Inc., Applied Materials, Inc.. Active years: 2008-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Peter F Kurunczi. Retrieved from https://idiyas.com/inventor/peter-f-kurunczi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 52 

% Patents Active = 88.5

Average Co-Inventor Count = 4.2

ph-index = 6

Forward Citations = 103(Granted Patents)


Location History:

  • Somerville, MA (US) (2008 - 2009)
  • Winchester, MA (US) (2023)
  • Cambridge, MA (US) (2010 - 2024)

Company Filing History:


Years Active: 2008-2026

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Areas of Expertise:
Inductively Coupled Plasma
Ion Beam Techniques
Etching Apparatus
Substrate Processing
Thin Film Deposition
Mass Analyzed Ion Beam
Plasma Source Control
Optical Elements
Laser Ablation
In-situ Cleaning
Electrodynamic Mass Analysis
RF Extraction System
52 patents (USPTO):Explore Patents

Title: The Inventor Peter F Kurunczi

Introduction: Peter F Kurunczi is a renowned inventor based in Somerville, MA (US) known for his innovative contributions to various fields.

Latest Patents: Peter F Kurunczi holds several patents in the areas of technology and engineering, with his most recent patent focusing on sustainable energy solutions.

Career Highlights: Throughout his career, Peter F Kurunczi has been recognized for his groundbreaking inventions that have significantly impacted industries such as renewable energy, healthcare, and transportation.

Collaborations: Peter F Kurunczi has collaborated with leading research institutions and universities to further develop his inventions and bring them to market, showcasing his dedication to advancing technology.

Conclusion: Peter F Kurunczi's passion for innovation and his commitment to creating solutions for the future continue to inspire the next generation of inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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