The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2023
Filed:
Sep. 13, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Alexandre Likhanskii, Middleton, MA (US);
Alexander S. Perel, Danvers, MA (US);
Jay T. Scheuer, Rowley, MA (US);
Bon-Woong Koo, Andover, MA (US);
Robert C. Lindberg, Rockport, MA (US);
Peter F. Kurunczi, Cambridge, MA (US);
Graham Wright, Newburyport, MA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
An ion source having an extraction plate with a variable thickness is disclosed. The extraction plate has a protrusion on its interior or exterior surface proximate the extraction aperture. The protrusion increases the thickness of the extraction aperture in certain regions. This increases the loss area in those regions, which serves as a sink for ions and electrons. In this way, the plasma density is decreased more significantly in the regions where the extraction aperture has a greater thickness. The shape of the protrusion may be modified to achieve the desired plasma uniformity. Thus, it may be possible to create an extracted ion beam having a more uniform ion density. In some tests, the uniformity of the beam current along the width direction was improved by between 20% and 50%.