Alexandre Likhanskii

This inventor holds 46 USPTO granted patents and 11 published patent applications, primarily in Ion Beam Technology. Top assignees: Applied Materials, Inc., Varian Semiconductor Equipment Associates, Inc.. Active years: 2016-2026.

USPTO Granted Patents = 46 (Patent Applications = 11)

% Patents Active = 97.8

Average Co-Inventor Count = 3.7

ph-index = 4

Forward Citations = 64(Granted Patents)

Location History:

Malden, MA (US) (2016 - 2023)
Middleton, MA (US) (2023)

Company Filing History:

24 out of 14,391

Applied Materials, Inc.

patents

22 out of 916

Varian Semiconductor Equipment Associates, Inc.

patents

Years Active: 2016-2026

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Areas of Expertise:

Ion Beam Extraction

Mass Analyzed Ion Beam

Electrostatic Filter

Plasma Source Control

High-Current Ion Implanter

Uniformity Control

Conductive Beam Optics

Electrodynamic Mass Analysis

In-Situ Plasma Cleaning

Variable Thickness Electrode

Mismatched Optics

High Brightness Ion Beam

46 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12712160 - RF BLOCKER FOR UNIFORMITY CONTROL (2026-08-18),

2. 12646682 - Heated plasma flood gun sweeper (2026-06-02),

3. 12573579 - Hybrid apparatus, system and techniques for mass analyzed ion beam (2026-03-10),

4. 12249488 - Plasma shaper to control ion flux distribution of plasma source (2025-03-11),

5. 12154753 - Device to control uniformity of extracted ion beam (2024-11-26),

6. D1051838 - Single-slot tubular cathode (2024-11-19),

7. 12125680 - Ion extraction assembly having variable electrode thickness for beam uniformity control (2024-10-22),

8. 11810746 - Variable thickness ion source extraction plate (2023-11-07),

9. 11791126 - Apparatus for directional processing (2023-10-17),

10. 11651932 - Mismatched optics for angular control of extracted ion beam (2023-05-16),

11. 11631567 - Ion source with single-slot tubular cathode (2023-04-18),

12. 11600473 - Ion source with biased extraction plate (2023-03-07),

13. 11587778 - Electrodynamic mass analysis with RF biased ion source (2023-02-21),

14. 11574800 - Extreme edge uniformity control (2023-02-07),

15. 11495434 - In-situ plasma cleaning of process chamber components (2022-11-08),

Title: Inventor Profile - Alexandre Likhanskii

Introduction: Alexandre Likhanskii is a renowned inventor based in Malden, MA (US) known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Alexandre Likhanskii holds several patents in the areas of artificial intelligence, machine learning, and robotics, showcasing his expertise in cutting-edge technologies.

Career Highlights: With a career spanning over two decades, Alexandre Likhanskii has worked with leading tech companies, research institutions, and universities, playing a pivotal role in developing advanced solutions for complex challenges.

Collaborations: Throughout his career, Alexandre Likhanskii has collaborated with top engineers, scientists, and researchers, fostering a culture of innovation and pushing the boundaries of technological advancements.

Conclusion: Alexandre Likhanskii's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.