The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2026
Filed:
May. 05, 2023
Applied Materials, Inc., Santa Clara, CA (US);
Frank Sinclair, Hartland, ME (US);
Paul Joseph Murphy, Reading, MA (US);
Bon-Woong Koo, Andover, MA (US);
Gregory Edward Stratoti, Sandown, NH (US);
Tseh-Jen Hsieh, Rowley, MA (US);
Alexandre Likhanskii, Middleton, MA (US);
Glenn Green, Woburn, MA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
An ion implanter that includes an ion source to generate an ion beam, a platen disposed in a process chamber to support a workpiece that is treated with the ion beam, and a plasma flood gun that results in fewer particles in the process chamber is disclosed. The plasma flood gun includes at least one plasma chamber, each having at least one aperture through which low energy ions and electrons are emitted. A sweeper is located near the aperture, positioned so as to be between the aperture and the upstream components. The sweeper is heated using resistive elements or a halogen lamp so as to elevate its temperature, which limited the amount of deposition that occurs on the sweeper.