Woburn, MA, United States of America

Glenn Green

This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2026.


% Patents Active = 50.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Glenn Green - Innovator in Ion Implantation Technology

Introduction

Glenn Green is a notable inventor based in Woburn, MA (US). He has made significant contributions to the field of ion implantation technology, particularly through his innovative designs that enhance the efficiency of semiconductor manufacturing processes.

Latest Patents

Glenn Green holds a patent for a "Dose cup assembly for an ion implanter." This invention focuses on a dose cup assembly that results in fewer particles in a process chamber. The assembly includes a faceplate attached to the back wall of the process chamber, featuring an opening, an aperture plate with multiple slots, and a tunnel with walls and sidewalls. The design ensures that at least one of the components has exposed outer surfaces made of silicon, which may also include materials like graphite, aluminum, or stainless steel coated with silicon or silicon carbide.

Career Highlights

Glenn Green is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to contribute to advancements in ion implantation technology, which is crucial for the production of integrated circuits.

Collaborations

Throughout his career, Glenn has collaborated with esteemed colleagues such as Tseh-Jen Hsieh and Bon-Woong Koo. These collaborations have fostered innovation and have been instrumental in the development of new technologies in the semiconductor field.

Conclusion

Glenn Green's contributions to ion implantation technology through his patent and work at Applied Materials, Inc. highlight his role as an influential inventor in the semiconductor industry. His innovative designs continue to impact the efficiency and effectiveness of semiconductor manufacturing processes.

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