The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2024
Filed:
Apr. 21, 2023
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Peter Kurunczi, Winchester, MA (US);
Joseph C. Olson, Beverly, MA (US);
Morgan Evans, Manchester, MA (US);
Rutger Meyer Timmerman Thijssen, Sunnyvale, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/34 (2006.01); G03F 7/00 (2006.01); G03F 7/09 (2006.01); B29C 33/38 (2006.01);
U.S. Cl.
CPC ...
G02B 6/34 (2013.01); G03F 7/0005 (2013.01); G03F 7/094 (2013.01); B29C 33/3842 (2013.01); G02B 2207/101 (2013.01); G03F 7/0002 (2013.01);
Abstract
A method for forming a device structure is disclosed. The method of forming a device structure includes forming a variable-depth structure in a device material layer using a laser ablation. A plurality of device structures is formed in the variable-depth structure to define slanted device structures therein. The variable-depth structure and the slanted device structures are formed using an etch process.