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For the Inventor, By the Inventor

Sunnyvale, CA, United States of America

Rutger Meyer Timmerman Thijssen

This inventor holds 87 USPTO granted patents and 15 published patent applications and 12 EPO patents, primarily in Optical Device Fabrication (CPC class G02B5-1857). Top assignees: Applied Materials, Inc., Varian Semiconductor Equipment Associates, Inc.. Active years: 2019-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rutger Meyer Timmerman Thijssen. Retrieved from https://idiyas.com/inventor/rutger-meyer-timmerman-thijssen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 87 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.3

ph-index = 5

Forward Citations = 113(Granted Patents)

Forward Citations (Not Self Cited) = 48(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Santa Clara, CA (US) (2022 - 2023)
  • Sunnyvale, CA (US) (2019 - 2024)
  • San Jose, CA (US) (2020 - 2024)

Company Filing History:

goldMedal79 out of 14,482 
 
Applied Materials, Inc.
 patents
silverMedal8 out of 916 
 
Varian Semiconductor Equipment Associates, Inc.
 patents

Years Active: 2019-2026

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Areas of Expertise:
Optical Devices
Nanostructures
Thin Film Deposition
Etching Methods
Gratings
Laser Ablation
Dielectric Substrates
Ion Beam Source
Diffraction Gratings
Photoresist Solutions
Shadow Mask Apparatus
Multi-Depth Structures
87 patents (USPTO):Explore Patents
1. 12710573 - PHOTORESIST LOADING SOLUTIONS FOR FLAT OPTICS FABRICATION (2026-08-18),
2. 12669635 - Controlling etch angles by substrate rotation in angled etch tools (2026-06-30),
3. 12607782 - Air-gap encapsulation of nanostructured optical devices (2026-04-21),
4. 12584211 - Method of thin film deposition in trenches (2026-03-24),
5. 12516410 - Dielectric filled nanostructured silica substrate for flat optical devices (2026-01-06),
6. 12454751 - Atomic layer deposition on optical structures (2025-10-28),
7. 12417892 - Shadow mask apparatus and methods for variable etch depths (2025-09-16),
8. 12416759 - Method for forming multi-depth optical devices (2025-09-16),
9. 12181736 - Nanostructures for optical devices (2024-12-31),
10. 12130465 - Variable height slanted grating method (2024-10-29),
11. 12117629 - Fabrication of optical devices utilizing dicing to maximize chamber space (2024-10-15),
12. 12106935 - Modulation of rolling k vectors of angled gratings (2024-10-01),
13. 12099241 - Forming variable depth structures with laser ablation (2024-09-24),
14. 12092956 - Nanoimprint and etch fabrication of optical devices (2024-09-17),
15. 12044821 - Apertures for flat optical devices (2024-07-23),

Title: Innovations and Contributions of Rutger Meyer Timmerman Thijssen

Introduction

Rutger Meyer Timmerman Thijssen is a prominent inventor based in Sunnyvale, CA, known for his significant contributions to the field of optical devices and nanotechnology. With an impressive portfolio of 77 patents, Timmerman Thijssen continues to push the boundaries of innovation.

Latest Patents

Among his latest inventions are two notable patents focused on nanostructures for optical devices. The first patent details embodiments of metasurfaces featuring nanostructures with specific geometric profiles and configurations. One embodiment describes a metasurface that includes a cuboidal or cylindrical nanostructure formed on a substrate. Another embodiment elaborates on a metasurface composed of multiple nanostructures spaced more than 35 nm apart on a substrate. The materials utilized for these nanostructures include TiO, silicon nitride, amorphous silicon, GaN, and aluminum zinc oxide, designed to achieve desired optical properties.

The second patent introduces a variable height slanted grating method, which encompasses an apparatus with a grating structure and a technique for its formation. This method involves creating a recess in the grating layer and defining a series of slanted grating structures through a selective etching procedure.

Career Highlights

Rutger Meyer Timmerman Thijssen has made significant strides in his career, working with renowned companies such as Applied Materials, Inc. and Varian Semiconductor Equipment Associates, Inc. His innovative work has been instrumental in advancing technology in these organizations.

Collaborations

Throughout his career, Timmerman Thijssen has collaborated with esteemed colleagues, including Morgan Evans and Ludovic Godet. These partnerships have enabled him to enhance the impact of his inventions and further the development of cutting-edge technologies.

Conclusion

In conclusion, Rutger Meyer Timmerman Thijssen exemplifies the spirit of innovation through his extensive work in nanotechnology and optical devices. His numerous patents showcase his commitment to advancing technology and improving industry standards. As he continues to innovate, the contributions of Timmerman Thijssen will undoubtedly leave a lasting imprint on the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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