The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2026
Filed:
Oct. 11, 2022
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Tapashree Roy, Bangalore, IN;
Rutger Meyer Timmerman Thijssen, Sunnyvale, CA (US);
Ludovic Godet, Sunnyvale, CA (US);
Jinxin Fu, Fremont, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 6/12 (2006.01); C03C 17/34 (2006.01); C23C 16/02 (2006.01); C23C 16/04 (2006.01); C23C 16/40 (2006.01);
U.S. Cl.
CPC ...
C23C 16/0227 (2013.01); C03C 17/3429 (2013.01); C23C 16/045 (2013.01); C23C 16/405 (2013.01);
Abstract
A method and apparatus for creating a flat optical structure is disclosed. The method includes etching at least one trench in a substrate, placing a dielectric material in at least one trench in the substrate and encapsulating the top of the substrate with a film.