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Jinxin Fu

This inventor holds 49 USPTO granted patents and 34 published patent applications and 6 EPO patents, primarily in Optical Devices. Top assignee: Applied Materials, Inc.. Active years: 2020-2026.

USPTO Granted Patents = 49 (Patent Applications = 34)

% Patents Active = 98.0

EPO Patents = 6 (Patent Applications = 32)

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 9(Granted Patents)

Company Filing History:

48 out of 14,391

Applied Materials, Inc.

patents

where one patent can have more than one assignee

Years Active: 2020-2026

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Areas of Expertise:

Optical Interconnects

Photonic Integrated Circuits

High Bandwidth Interfaces

Optical Gratings

Metrology Systems

Waveguide Combiners

Ultra-Wide Angle Lens

Ion Implantation

Lithography Method

Composite Imaging

Dielectric Substrate

Optical Resolution

49 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12730256 - Methods to reduce optical loss of an AR waveguide (2026-09-08),

2. 12710579 - INKJET GRADIENT INDEX MATERIAL TO MODULATE GRATING DIFFRACTION EFFICIENCY (2026-08-18),

3. 12710337 - ILLUMINATION SYSTEM FOR AR METROLOGY TOOL (2026-08-18),

4. 12705843 - Microlens display apparatus for use in an augmented reality system (2026-08-11),

5. 12669708 - Method to improve display efficiency and uniformity of AR waveguide (2026-06-30),

6. 12663647 - Metalens stack on waveguide combiners for AR/VR glasses (2026-06-23),

7. 12662650 - Surface treatment method to remove contaminated and implanted waveguide surface (2026-06-23),

8. 12578527 - Reconfigurable optical interconnects for co-packaged devices including photonic integrated circuits (2026-03-17),

9. 12560510 - Methods of geometry parameters measurement for optical gratings (2026-02-24),

10. 12523828 - High bandwidth density optical interfaces for co-packaged devices including photonic integrated circuits (2026-01-13),

11. 12516410 - Dielectric filled nanostructured silica substrate for flat optical devices (2026-01-06),

12. 12416858 - Optical device with elements having outwardly-curved opposing leading edges spaced according to a duty cycle, pitch, and critical dimension (2025-09-16),

13. 12398998 - Methods for high-resolution, stable measurement of pitch and orientation in optical gratings (2025-08-26),

14. 12393025 - Waveguide combiners having arrangements for image uniformity (2025-08-19),

15. 12386155 - Ultra-wide angle lens systems with external pupil (2025-08-12),

Certainly! Here is the article based on the information provided:

Title: Jinxin Fu: Pioneering Innovation in Optical Device Metrology

Introduction: Jinxin Fu, a visionary inventor based in Fremont, CA (US), has been at the forefront of groundbreaking innovations in the field of optical device metrology. With a strong dedication to creating impactful solutions, his passion for innovation has set him apart as a pioneering figure in the industry.

Latest Patents: Jinxin Fu holds an impressive portfolio of 17 patents, with his latest contributions focusing on revolutionary technologies. One notable patent is the "Interference in-sensitive Littrow system for optical device structure measurement," which introduces advanced methods for measuring the pitch and orientation angle of optical device structures. Another significant patent is the "Method to measure light loss of optical films and optical substrates," presenting a novel approach to optical device metrology.

Career Highlights: Jinxin Fu is a key member of Applied Materials, Inc., a leading company in the field of semiconductor manufacturing and materials engineering. His expertise and innovative spirit have helped drive the company's success and reputation for cutting-edge technologies in the industry.

Collaborations: Jinxin Fu has collaborated with esteemed colleagues such as Ludovic Godet and Rutger Meyer Timmerman Thijssen, further enhancing his contributions to the field of optical device metrology. Together, they have worked on projects that have pushed the boundaries of innovation and technological advancement.

Conclusion: Jinxin Fu's relentless pursuit of excellence and unwavering commitment to innovation continue to inspire inventors and industry professionals worldwide. His pioneering work in optical device metrology not only showcases his technical prowess but also solidifies his reputation as a visionary inventor shaping the future of the industry.

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