The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2026
Filed:
May. 05, 2023
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Jinxin Fu, Fremont, CA (US);
Ludovic Godet, Sunnyvale, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 27/01 (2006.01); F21V 8/00 (2006.01); G02B 1/115 (2015.01); G02B 6/42 (2006.01);
U.S. Cl.
CPC ...
G02B 27/0172 (2013.01); G02B 6/0016 (2013.01); G02B 6/0038 (2013.01); G02B 1/115 (2013.01); G02B 6/4212 (2013.01); G02B 2027/0112 (2013.01);
Abstract
Embodiments of the present disclosure generally relate to methods of modifying and engineering the effective thickness of an optical device substrate. The methods provide for depositing a material that is index-matched to the substrate to alter a thickness distribution of the optical device. By adjusting the thickness distribution, the optical path of light is modulated to direct the light to the output coupling grating.
Fu, Jinxin. (2026). Method to improve display efficiency and uniformity of ar waveguide (U.S. Patent No. 12669708). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12669708
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile