Manchester, MA, United States of America

Morgan Evans

This inventor holds 86 USPTO granted patents and 10 published patent applications and 7 EPO patents, primarily in Angled Etching Techniques (CPC class G02B5-1857). Top assignees: Varian Semiconductor Equipment Associates, Inc., Applied Materials, Inc.. Active years: 2004-2026.

USPTO Granted Patents = 86 

% Patents Active = 95.3

 

Average Co-Inventor Count = 3.4

ph-index = 7

Forward Citations = 281(Granted Patents)

Forward Citations (Not Self Cited) = 209(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Manchester-by-the-Sea, MA (US) (2004)
  • Manchester, MA (US) (2004 - 2024)

Company Filing History:


Years Active: 2004-2026

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Areas of Expertise:
Etch Depth Control
Angled Gratings
Laser Ablation
Shadow Mask
Optical Elements
Substrate Rotation
Multielectrode Extraction
Slanted Gratings
Ion Beam Modulation
Carrier Proximity Mask
Selectively Etching
Semiconductor Devices
86 patents (USPTO):Explore Patents

Title: Morgan Evans: A Trailblazer in Innovative Patents

Introduction:

Morgan Evans, a distinguished inventor hailing from Manchester, MA, has made significant contributions to the field of innovation with his remarkable inventions. Throughout his illustrious career, Evans has been recognized for his inventive work, receiving accolades such as the Inventor of the Year Award from the Massachusetts Inventors Hall of Fame. This article delves into his latest patents, career highlights, notable collaborations, and concludes with an appreciation of his ground-breaking innovations.

Latest Patents:

Evans' latest patents exemplify his expertise in improving functionality and performance. One of his recent patents is related to "Etch improvement," which outlines a method to enhance the etching process by exposing a first material on a substrate to an ion beam. By meticulously varying the exposure of the material, Evans generates depth variation to create a first plurality of structures, significantly improving the precision and efficacy of the etching process.

Another noteworthy patent in Evans' portfolio is the "Method of forming a plurality of gratings," which focuses on the formation of multiple gratings on a waveguide combiner substrate. This method involves depositing a material that protects certain regions of the waveguide combiner while allowing the formation of gratings in others. Evans' inventive approach paves the way for enhanced functionality and versatility in waveguide combiners.

Career Highlights:

Evans' career has been marked by numerous milestones and achievements. Throughout his journey, he has worked with reputable companies such as Varian Semiconductor Equipment Associates, Inc., and Applied Materials, Inc. These collaborations have provided him with valuable opportunities to refine his innovative thinking and contribute to cutting-edge technological advancements.

Collaborations:

Within his expansive network of collaborators, Joseph C Olson and Rutger Meyer Timmerman Thijssen hold a special place. These colleagues have played integral roles in supporting Evans' inventive endeavors. Collaborative efforts often fuel innovation, and the contributions from Olson and Thijssen have undoubtedly enriched Evans' inventive legacy.

Conclusion:

Morgan Evans' inventive prowess and dedication to improving existing processes have earned him significant recognition in the field of innovation. With an impressive portfolio of patents and a reputation for groundbreaking work, Evans continues to push boundaries and contribute to the advancement of technology. His collaborations with esteemed companies and colleagues further underline his unwavering commitment to driving progress. Evans' inventive journey serves as an inspiration to aspiring inventors and stands as a testament to the transformative power of innovation.

Profile summary based on public USPTO records.
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