The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2023

Filed:

Feb. 11, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Morgan Evans, Manchester, MA (US);

Joseph C. Olson, Beverly, MA (US);

Rutger Meyer Timmerman Thijssen, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01); B23K 26/34 (2014.01); C04B 41/00 (2006.01); G02B 6/34 (2006.01); G03F 7/00 (2006.01); B23K 26/364 (2014.01); F21V 8/00 (2006.01); G06F 3/01 (2006.01);
U.S. Cl.
CPC ...
B23K 26/34 (2013.01); B23K 26/364 (2015.10); C04B 41/0036 (2013.01); G02B 5/1819 (2013.01); G02B 5/1857 (2013.01); G02B 6/34 (2013.01); G03F 7/0005 (2013.01); G02B 6/0016 (2013.01); G02B 6/0065 (2013.01); G06F 3/011 (2013.01);
Abstract

Embodiments of the present application generally relate to methods for forming a plurality of gratings. The methods generally include depositing a material over one or more protected regions of a waveguide combiner disposed on a substrate, the material having a thickness inhibiting removal of a grating material disposed on the waveguide combiner when an ion beam is directed toward the substrate, and directing the ion beam toward the substrate. The methods disclosed herein allow for formation of a plurality of gratings in one or more unprotected regions, while no gratings are formed in the protected regions.


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