The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2026
Filed:
Dec. 28, 2023
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventor:
Morgan Evans, Manchester, MA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10P 50/28 (2026.01); G05B 19/4155 (2006.01); H01J 37/08 (2006.01); H01J 37/20 (2006.01); H01J 37/305 (2006.01);
U.S. Cl.
CPC ...
H10P 50/283 (2026.01); G05B 19/4155 (2013.01); H01J 37/20 (2013.01); H01J 37/305 (2013.01); G05B 2219/45212 (2013.01); H01J 37/08 (2013.01); H01J 2237/20228 (2013.01);
Abstract
A method may include providing a stress the substrate having a main surface, and forming a patterned stress compensation layer on the main surface, wherein the patterned stress compensation layer is formed by exposing the main surface to a processing beam while a movement of the ion beam with respect to the main surface takes place.
Evans, Morgan. (2026). Substrate stress management using direct selective area processing (U.S. Patent No. 12772766). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12772766
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile