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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11718914 B1

PDFFull Text
Date of Patent:
Aug. 08, 2023

Filed:

Sep. 04, 2020

Techniques for controlling precursors in chemical deposition processes

Applicant:

Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);

Inventors:

Elaina Babayan, Gloucester, MA (US);

Sarah White, Gloucester, MA (US);

Vijay Venugopal, Gloucester, MA (US);

Jonathan Bakke, Gloucester, MA (US);

Assignee:

Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);

Attorney:

KDW Firm PLLC

Primary Examiner:

Jermele M Hollington

Assistant Examiner:

Temilade S Rhodes-Vivour

Int. Cl.
CPC ...
C23C 16/52 (2006.01); C23C 16/448 (2006.01); H01L 21/67 (2006.01); C23C 16/455 (2006.01); G05D 16/04 (2006.01); G01F 1/00 (2022.01); G05D 11/13 (2006.01); G05D 16/00 (2006.01); H01L 21/00 (2006.01); H01L 21/66 (2006.01); G05D 11/00 (2006.01);
U.S. Cl.
CPC ...
C23C 16/52 (2013.01); C23C 16/448 (2013.01); C23C 16/45544 (2013.01); C23C 16/45553 (2013.01); G01F 1/00 (2013.01); G05D 11/00 (2013.01); G05D 11/132 (2013.01); G05D 16/00 (2013.01); G05D 16/04 (2013.01); G05D 16/0402 (2019.01); H01L 21/00 (2013.01); H01L 21/67253 (2013.01); H01L 22/00 (2013.01);
Abstract

An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.

Find Patent Forward Citations

Babayan, Elaina. (2023). Techniques for controlling precursors in chemical deposition processes (U.S. Patent No. 11718914). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11718914

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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