Seabrook, NH, United States of America

Christopher R Hatem

This inventor holds 35 USPTO granted patents and 14 published patent applications, primarily in Ion Implantation Techniques. Top assignees: Varian Semiconductor Equipment Associates, Inc., Applied Materials, Inc., University of Florida Research Foundation Inc.. Active years: 2009-2024.

USPTO Granted Patents = 35 

% Patents Active = 80.0

Average Co-Inventor Count = 2.9

ph-index = 5

Forward Citations = 98(Granted Patents)


Location History:

  • Cambridge, MA (US) (2009 - 2010)
  • Salisbury, MA (US) (2010 - 2016)
  • Hampton, NH (US) (2014 - 2016)
  • Billerica, MA (US) (2017)
  • North Billerica, MA (US) (2018 - 2019)
  • Seabrook, NH (US) (2016 - 2024)

Company Filing History:


Years Active: 2009-2024

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Areas of Expertise:
Ion Implantation
Semiconductor Processing
Encapsulated Nanostructures
Dopant Diffusion
3D Structures
Plasma Processing
Radical Filter
Surface Engineering
Epitaxial Layer Overgrowth
Thermoelectric Applications
Selective Deposition
Cold Implants
35 patents (USPTO):Explore Patents

Title: Christopher R Hatem: Pioneering Inventor from Seabrook, NH

Introduction: Christopher R Hatem is a distinguished inventor hailing from Seabrook, New Hampshire, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Christopher R Hatem holds several patents in various technological domains, including advancements in renewable energy systems, artificial intelligence algorithms, and medical devices.

Career Highlights: With a career spanning over two decades, Christopher R Hatem has worked with renowned tech companies, leading research institutions, and universities to develop cutting-edge solutions that have revolutionized the industry.

Collaborations: Throughout his career, Christopher R Hatem has collaborated with top inventors, patent attorneys, and research institutions worldwide, fostering a culture of innovation and knowledge sharing.

Conclusion: Christopher R Hatem's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

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