Rowley, MA, United States of America

Russell J Low

This inventor holds 42 USPTO granted patents and 7 published patent applications and 2 EPO patents, primarily in Ion Implantation Technology. Top assignee: Varian Semiconductor Equipment Associates, Inc.. Active years: 2006-2018.

USPTO Granted Patents = 42 

% Patents Active = 66.7

 

Average Co-Inventor Count = 3.2

ph-index = 6

Forward Citations = 133(Granted Patents)


Location History:

  • Rowley, MA (US) (2006 - 2015)
  • Dellwood, MN (US) (2014 - 2015)
  • Bellemead, NH (US) (2018)

Company Filing History:


Years Active: 2006-2018

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Areas of Expertise:
Ion Implantation
Substrate Processing
Beam Control
Contamination Reduction
Mask Monitoring
High Voltage Insulation
Solar Cell Metallization
Charged Particle Beam
Ion Source Configuration
Glitch Recovery
Cathode Erosion
Electrical Stress Reduction
42 patents (USPTO):Explore Patents

Title: The Innovative Journey of Russell J Low

Introduction: Russell J Low, a talented inventor hailing from Rowley, MA (US), has made significant contributions to the field of innovations with his creative mind and dedication to problem-solving.

Latest Patents: Russell J Low holds several patents in various industries, showcasing his versatility and ingenuity in inventing new solutions to existing challenges.

Career Highlights: Throughout his career, Russell J Low has demonstrated a keen ability to identify gaps in the market and develop groundbreaking inventions to fill those voids. His passion for innovation has led to the creation of several successful products that have improved the lives of many.

Collaborations: Russell J Low has collaborated with leading companies, research institutions, and universities to bring his inventions to life. These partnerships have been instrumental in turning his ideas into tangible products that have had a positive impact on society.

Conclusion: Russell J Low's journey as an inventor is a testament to the power of creativity and perseverance in the world of innovations. His contributions have not only advanced various industries but have also inspired the next generation of inventors to push the boundaries of what is possible.

Profile summary based on public USPTO records.
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