The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2015
Filed:
Apr. 07, 2010
Applicants:
Kevin M. Daniels, Lynnfield, MA (US);
Russell J. Low, Rowley, MA (US);
Benjamin B. Riordon, Newburyport, MA (US);
Inventors:
Kevin M. Daniels, Lynnfield, MA (US);
Russell J. Low, Rowley, MA (US);
Benjamin B. Riordon, Newburyport, MA (US);
Assignee:
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 5/10 (2006.01); H01L 21/266 (2006.01); H01J 37/317 (2006.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
H01L 21/266 (2013.01); H01J 37/3171 (2013.01); H01J 2237/024 (2013.01); H01J 2237/045 (2013.01); H01J 2237/31711 (2013.01); H01L 31/18 (2013.01);
Abstract
Herein, an improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be achieved using a mask for processing the substrate. The mask may be incorporated into a substrate processing system such as, for example, an ion implantation system. The mask may comprise a first base; and a plurality of fingers spaced apart from one another to define one or more gaps.