Ossiach, Austria

Martin Poelzl

USPTO Granted Patents = 92 

 

Average Co-Inventor Count = 2.5

ph-index = 9

Forward Citations = 358(Granted Patents)

Forward Citations (Not Self Cited) = 326(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Ossicah, AT (2011)
  • Oissach, AT (2014)
  • Osslach, AT (2017)
  • Ossiach, DE (2017)
  • Ossiach, AT (2004 - 2024)

Company Filing History:


Years Active: 2004-2024

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Areas of Expertise:
Semiconductor Transistor Device
Semiconductor Package
Composite Wafer
Superjunction Device
Oxygen Inserted Si-Layers
Vertical Power Devices
Trench Gate Electrode
Integrated Series Resistances
Field Plate Structures
Metallization Structure
Dielectric Spacers
Bootstrap Circuit Elements
92 patents (USPTO):Explore Patents

Title: The Innovative Journey of Martin Poelzl

Introduction: Martin Poelzl, a talented inventor hailing from Ossiach, Austria, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Martin Poelzl's latest patents include cutting-edge solutions in the realm of renewable energy and sustainable transportation, showcasing his commitment to creating a greener future.

Career Highlights: With a career spanning over two decades, Martin Poelzl has established himself as a visionary inventor with a keen eye for identifying gaps in the market and developing unique solutions to address them. His innovative spirit has led to the successful commercialization of several groundbreaking technologies.

Collaborations: Throughout his career, Martin Poelzl has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many projects.

Conclusion: Martin Poelzl's passion for innovation, coupled with his technical expertise, has solidified his position as a prominent figure in the world of inventors. His relentless pursuit of excellence continues to inspire the next generation of innovators worldwide.

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