Mark Douglas Hall

This inventor holds 74 USPTO granted patents and 7 published patent applications and 2 EPO patents, primarily in Nanosheet Transistors (CPC class H01L). Top assignees: Freescale Semiconductor,inc., Nxp USA, Inc., Nxp B.v.. Active years: 1998-2026.

USPTO Granted Patents = 74 (Patent Applications = 7)

% Patents Active = 77.0

EPO Patents = 2

Average Co-Inventor Count = 2.5

ph-index = 9

Forward Citations = 331(Granted Patents)

Forward Citations (Not Self Cited) = 243(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Austin, TN (US) (2014)
San Jose, CA (US) (2020)
Austin, TX (US) (1998 - 2024)

Company Filing History:

54 out of 5,491

Freescale Semiconductor,inc.

Advanced Micro Devices Corporation

patents

6. 2 out of 834,411

Other

patents

where one patent can have more than one assignee

Years Active: 1998-2026

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Areas of Expertise:

Nanosheet Transistors

Non-Volatile Memory

Semiconductor Devices

MEMS Sensors

Capacitors

High Speed Buffer

Split-Gate Device

Dielectric Thickness

Logic Transistor

Nanopillar Structures

Power Consumption

Radiation Measurement

74 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12622054 - Integration of multimodal transistors with transistor fabrication sequence (2026-05-05),

2. 12483258 - DAC and ADC using MMT devices (2025-11-25),

3. 12363936 - Nanosheet transistors with reduced source/drain resistance and associated method of manufacture (2025-07-15),

4. 12009267 - Nanosheet device with different gate lengths in same stack (2024-06-11),

5. 11776856 - Nanosheet transistors with different gate materials in same stack and method of making (2023-10-03),

6. 11769797 - Method of making nanosheet fringe capacitors or MEMS sensors with dissimilar electrode materials (2023-09-26),

7. 11685647 - Nanosheet MEMs sensor device and method of manufacture (2023-06-27),

8. 11616506 - High speed buffer circuit (2023-03-28),

9. 11605729 - Method of making nanosheet local capacitors and nvm devices (2023-03-14),

10. 10727224 - Decoupling capacitors using regularity finFET structures and methods for making same (2020-07-28),

11. 10566268 - Package to die connection system and method therefor (2020-02-18),

12. 10242988 - Antifuses integrated on semiconductor-on-insulator (SOI) substrates (2019-03-26),

13. 9716141 - Applications for nanopillar structures (2017-07-25),

14. 9702925 - Semiconductor device with upset event detection and method of making (2017-07-11),

15. 9472418 - Method for forming a split-gate device (2016-10-18),

Title: Mark Douglas Hall: Pioneering Innovations in Nanosheet Technology

Introduction:

Mark Douglas Hall, an innovative inventor based in Austin, TX, has made significant contributions to the field of technology with his passion for innovation and dedication to pushing boundaries. With a remarkable portfolio of 70 patents, Mark's work continues to inspire the next generation of inventors and shape the future of technology.

Latest Patents:

Mark's latest patents showcase his expertise in nanosheet technology, including "Nanosheet transistors with different gate materials in same stack" and "Method of making nanosheet fringe capacitors or MEMS sensors with dissimilar electrode materials." These patents highlight his ingenuity in integrating stacked top and bottom nanosheet transistors and fabricating nanosheet transistors, capacitors, and sensors in a single process flow.

Career Highlights:

Throughout his career, Mark has worked in prominent companies such as Freescale Semiconductor, Inc. and NXP USA, Inc. His innovative spirit and technical expertise have earned him recognition as a thought leader in semiconductor technology, particularly in the development of advanced nanosheet devices.

Collaborations:

Mark has collaborated with talented individuals in the industry, including coworkers Mehul D Shroff and Frank Kelsey Baker, Jr. Together, they have contributed to groundbreaking research and development projects, further solidifying Mark's reputation as a trailblazer in the field of inventions.

Conclusion:

Mark Douglas Hall's relentless pursuit of innovation and his groundbreaking work in nanosheet technology position him as a true pioneer in the field of inventions. His dedication to pushing technological boundaries and inspiring future generations of inventors make him a force to be reckoned with in the ever-evolving landscape of technology.