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For the Inventor, By the Inventor

Zhubei, Taiwan

Chih-Tang Peng

USPTO Granted Patents = 66 

Average Co-Inventor Count = 5.4

ph-index = 7

Forward Citations = 171(Granted Patents)

Forward Citations (Not Self Cited) = 154(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Taipei, TW (2009 - 2017)
  • Hsinchu County, TW (2016 - 2022)
  • Zhubei, TW (2014 - 2024)

Company Filing History:

goldMedal66 out of 40,674 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2009-2025

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Areas of Expertise:
Semiconductor Structures
FinFET Devices
Cyclic Spin-On Coating
Dielectric Materials
Atomic Layer Deposition
Vertical Structures
Tunnel Field-Effect Transistors
Isolation Features
High Aspect Ratio
Self-Aligned Insulated Films
Gap-Fill Methods
Strained Isolation Regions
66 patents (USPTO):Explore Patents
1. 12369390 - Method for forming semiconductor structure with high aspect ratio (2025-07-22),
2. 12315759 - FinFET device and method of forming same (2025-05-27),
3. 12266728 - Semiconductor device and method of manufacture (2025-04-01),
4. 12170199 - Cyclic spin-on coating process for forming dielectric material (2024-12-17),
5. 11942549 - Semiconductor device and method of manufacture (2024-03-26),
6. 11862508 - FinFET device and method of forming same (2024-01-02),
7. 11823960 - Method for forming semiconductor structure with high aspect ratio (2023-11-21),
8. 11791154 - Cyclic spin-on coating process for forming dielectric material (2023-10-17),
9. 11527653 - Semiconductor device and method of manufacture (2022-12-13),
10. 11450526 - Cyclic spin-on coating process for forming dielectric material (2022-09-20),
11. 11444173 - Semiconductor device structure with salicide layer and method for forming the same (2022-09-13),
12. 11387138 - Integrated circuit isolation feature and method of forming the same (2022-07-12),
13. 11227788 - Method of forming isolation layer (2022-01-18),
14. 11222826 - FinFET structure and device (2022-01-11),
15. 11094545 - Self-aligned insulated film for high-K metal gate device (2021-08-17),

Title: The Innovative Journey of Chih-Tang Peng

Introduction:

Chih-Tang Peng, a distinguished inventor hailing from Zhubei, Taiwan, has made significant contributions to the field of technology and innovation through his groundbreaking work.

Latest Patents:

Chih-Tang Peng's latest patents showcase his commitment to pushing the boundaries of technological advancement and include cutting-edge solutions in the fields of electronics and telecommunications.

Career Highlights:

With a career spanning several decades, Chih-Tang Peng has held key roles in various tech companies, where he has spearheaded research and development projects that have led to the creation of revolutionary products and technologies.

Collaborations:

Throughout his career, Chih-Tang Peng has collaborated with leading researchers, engineers, and innovators from around the globe, fostering a culture of creativity and excellence that has resulted in numerous successful projects and inventions.

Conclusion:

In conclusion, Chih-Tang Peng's relentless pursuit of innovation and his passion for creating solutions to complex technological challenges have solidified his reputation as a visionary inventor in the world of technology.

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