Blandine Duriez

This inventor holds 77 USPTO granted patents, primarily in Semiconductor Technology (CPC class H01L). Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Nxp B.v.. Active years: 2014-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Blandine Duriez. Retrieved from https://idiyas.com/inventor/blandine-duriez

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 77

% Patents Active = 87.0

Average Co-Inventor Count = 3.1

ph-index = 6

Forward Citations = 242(Granted Patents)

Forward Citations (Not Self Cited) = 207(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Brussells, BE (2017)
Brussels, DE (2017)
Brussels, FR (2017)
Bruxelles, DE (2017)
Bruxelles, FR (2018)
Hsinchu, TW (2023)
Brussels, BE (2014 - 2024)

Company Filing History:

70 out of 42,872

Taiwan Semiconductor Manufacturing Comp. Ltd.

Years Active: 2014-2026

Loading Chart...

Areas of Expertise:

Multigate Device

VGAA Transistor

Carbon Nanotube

Laser Annealing

Semiconductor Structure

Metal Oxide Memory

Germanium Nanowires

MOSFETs

FinFET Transistor

Localized Heating

Epitaxial Layers

Crystalline Semiconductor

77 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12690233 - Raised source/drain oxide semiconducting thin film transistor and methods of making the same (2026-07-21),

2. 12490456 - Multigate device having reduced contact resistivity (2025-12-02),

3. 12238914 - Heterostructure oxide semiconductor vertical gate-all-around (VGAA) transistor and methods for making the same (2025-02-25),

4. 12193318 - Method of forming semiconductor device having carbon nanotube (2025-01-07),

5. 12080771 - Multigate device having reduced contact resistivity (2024-09-03),

6. 12027592 - Method of manufacturing a heterostructure or a stacked semiconductor structure having a silicon-germanium interface (2024-07-02),

7. 11967647 - Localized heating in laser annealing process (2024-04-23),

8. 11949020 - Transistor, integrated circuit, and manufacturing method (2024-04-02),

9. 11949013 - Semiconductor device and method (2024-04-02),

10. 11942147 - Semiconducting metal oxide memory device using hydrogen-mediated threshold voltage modulation and methods for forming the same (2024-03-26),

11. 11848385 - Localized protection layer for laser annealing process (2023-12-19),

12. 11830947 - Method of manufacturing a semiconductor device and a semiconductor device (2023-11-28),

13. 11764289 - Method of manufacturing a semiconductor device and a semiconductor device (2023-09-19),

14. 11672110 - Heterostructure oxide semiconductor vertical gate-all-around (VGAA) transistor and methods for making the same (2023-06-06),

15. 11616122 - Germanium containing nanowires and methods for forming the same (2023-03-28),

Title: The Innovator Extraordinaire: Blandine Duriez

Introduction:

Blandine Duriez, a brilliant inventor hailing from Brussels, Belgium, has left an indelible mark on the world through his innovative creations. With a staggering 71 patents to his name, Duriez exemplifies how one individual can revolutionize the technology landscape.

Latest Patents:

Among his latest patents is the groundbreaking invention of "Localized Heating in Laser Annealing Process." This method enables the efficient formation of semiconductor devices by utilizing laser irradiation to activate dopants in source/drain contact regions, ushering in a new era of semiconductor manufacturing efficiency. Additionally, Duriez's patent for a "Transistor, Integrated Circuit, and Manufacturing Method" showcases his prowess in developing advanced transistor technologies for cutting-edge integrated circuits.

Career Highlights:

Duriez's illustrious career has seen him making significant contributions to renowned companies such as Taiwan Semiconductor Manufacturing Company Ltd. and NXP B.V. His innovative spirit and technical expertise have been instrumental in advancing the semiconductor industry and shaping the future of electronics.

Collaborations:

Throughout his career, Duriez has collaborated with esteemed colleagues such as Martin Christopher Holland and Mark van Dal. Together, they have worked tirelessly to push the boundaries of technology and create transformative solutions that have a lasting impact on the industry.

Conclusion:

In conclusion, Blandine Duriez's remarkable journey as an inventor serves as a testament to the power of innovation and the profound influence that one individual can have on the world. His relentless pursuit of excellence and revolutionary inventions have cemented his legacy as a true pioneer in the realm of technology.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]