The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 2024

Filed:

Jul. 25, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company Limited, Hsinchu, TW;

Inventors:

Marcus Johannes Henricus Van Dal, Linden, BE;

Gerben Doornbos, Kessel-Lo, BE;

Georgios Vellianitis, Haverlee, BE;

Blandine Duriez, Brussels, BE;

Mauricio Manfrini, Zhubei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 11/00 (2006.01); G11C 13/00 (2006.01); H10B 63/00 (2023.01); H10N 70/00 (2023.01); H10N 70/20 (2023.01);
U.S. Cl.
CPC ...
G11C 13/0007 (2013.01); G11C 13/0069 (2013.01); H10B 63/34 (2023.02); H10B 63/80 (2023.02); H10N 70/011 (2023.02); H10N 70/253 (2023.02); H10N 70/841 (2023.02); H10N 70/8833 (2023.02);
Abstract

A memory device is provided, which may include a first electrode, a memory layer stack including at least one semiconducting metal oxide layer and at least one hydrogen-containing metal layer, and a second electrode. A semiconductor device is provided, which may include a semiconducting metal oxide layer containing a source region, a drain region, and a channel region, a hydrogen-containing metal layer located on a surface of the channel region, and a gate electrode located on the hydrogen-containing metal layer. Each hydrogen-containing metal layer may include at least one metal selected from platinum, iridium, osmium, and ruthenium at an atomic percentage that is at least 90%, and may include hydrogen atoms at an atomic percentage in a range from 0.001% to 10%. Hydrogen atoms may be reversibly impregnated into a respective semiconducting metal oxide layer to change resistivity and to encode a memory bit.


Find Patent Forward Citations

Loading…